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Proceedings Paper

High-etch rate uniformity quartz etch for advanced alternating phase-shift masks
Author(s): Brigitte C. Stoehr; Josef Mathuni; Norbert Falk; Tianzong Xu
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Paper Details

Date Published:
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.494550
Show Author Affiliations
Brigitte C. Stoehr, Applied Materials (United States)
Josef Mathuni, Infineon Technologies AG (Germany)
Norbert Falk, Applied Materials (Germany)
Tianzong Xu, Applied Materials (United States)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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