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Proceedings Paper

High-accuracy and high-throughput reticle inspection system LM5000
Author(s): Shingo Murakami; Hiroyuki Takahashi; Masayoshi Kimura; Naohisa Takayama; Fuyuhiko Matsuo
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Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.494544
Show Author Affiliations
Shingo Murakami, NEC Corp. (Japan)
Hiroyuki Takahashi, NEC Corp. (Japan)
Masayoshi Kimura, NEC Corp. (Japan)
Naohisa Takayama, NEC Corp. (Japan)
Fuyuhiko Matsuo, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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