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Proceedings Paper

Electron-beam-written reflection diffractive microlenses for oblique incidence
Author(s): Teruhiro Shiono; Hisahito Ogawa
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Paper Abstract

Reflection microlenses for oblique incidence can be flexibly used without a beam splitter, and also could be key devices in planar optics and optical interconnections with a zigzag optical path within the substrate. The functions of the electron-beam writing system that we developed have been expanded so that the diffraction-limited microlenses for oblique incidence can be fabricated. It is demonstrated that electron-beam written microlenses including rectangular- apertured lens array exhibit the diffraction-limited focusing characteristics with 78% high efficiency at a large oblique angle of 30 degree(s).

Paper Details

Date Published: 1 October 1991
PDF: 9 pages
Proc. SPIE 1545, International Conference on the Application and Theory of Periodic Structures, (1 October 1991); doi: 10.1117/12.49421
Show Author Affiliations
Teruhiro Shiono, Matsushita Electric Industrial Co., Ltd. (Japan)
Hisahito Ogawa, Matsushita Electric Industrial Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1545:
International Conference on the Application and Theory of Periodic Structures
Jeremy M. Lerner; Wayne R. McKinney, Editor(s)

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