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Proceedings Paper

Highly accurate x-ray mask with high-density patterns
Author(s): Masaru Shimada; Tai Tsuchizawa; Shingo Uchiyama; Takashi Ohkubo; Masatoshi Oda; Ikuo Okada
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Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, ; doi: 10.1117/12.493519
Show Author Affiliations
Masaru Shimada, Nippon Telegraph and Telephone Corp. (Japan)
Tai Tsuchizawa, Nippon Telegraph and Telephone Corp. (Japan)
Shingo Uchiyama, Nippon Telegraph and Telephone Corp. (Japan)
Takashi Ohkubo, Nippon Telegraph and Telephone Corp. (Japan)
Masatoshi Oda, NTT Advanced Technology Corp. (Japan)
Ikuo Okada, Nippon Telegraph and Telephone Corp. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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