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Estimating wafer printability with practical mask image
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Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.491920
Show Author Affiliations
Nobuhito Toyama, Dai Nippon Printing Co., Ltd. (Japan)
Syogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Shigekazu Fujimoto, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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