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Proceedings Paper

Advances in multilayer technology for commercial EUVL systems
Author(s): Donald W. Sweeney; Sasa Bajt; Regina Soufli; Jennifer B. Alameda; Mark A. Schmidt
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Proc. SPIE 4688, Emerging Lithographic Technologies VI, ; doi: 10.1117/12.490604
Show Author Affiliations
Donald W. Sweeney, Lawrence Livermore National Lab. (United States)
Sasa Bajt, Lawrence Livermore National Lab. (United States)
Regina Soufli, Lawrence Livermore National Lab. (United States)
Jennifer B. Alameda, Lawrence Livermore National Lab. (United States)
Mark A. Schmidt, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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