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Experimental study of the optical properties of LTCVD SiO2Format | Member Price | Non-Member Price |
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Paper Abstract
Experimental results are presented on the optical and infrared properties of Si02, deposited on Si
by means of low temperature thermal decomposition of silane with a mixture of oxygen, in a
flowing nitrogen atmosphere. The experimental conditions during the deposition were chosen
such that the decomposition of silane was sufficiently low for the growth of uniform and dense
layers. Good control on thickness in the range 50 to 230 nm was obtained by selecting proper
growth temperature and nitrogen carrier gas flow rate. It was found, experimentally, that the
refractive index varies as a function of the Si02 thickness up to a certain point and only then attains
its constant value. The Infrared absorption spectrum of the above films was studied in the range of
200 cm1 to 4000 cm1. The position and widths ofthe absorption bands at nominally 1070, 810
cm1 d 465 nm, and the changes in these as a function of thickness were used to shed light on
the behaviour of the refractive index. It was also established that the absorption bands obey the
Lambert-Bouguer law.
Paper Details
Date Published: 1 April 1991
PDF: 8 pages
Proc. SPIE 1442, 7th Mtg in Israel on Optical Engineering, (1 April 1991); doi: 10.1117/12.49055
Published in SPIE Proceedings Vol. 1442:
7th Mtg in Israel on Optical Engineering
Moshe Oron; Itzhak Shladov, Editor(s)
PDF: 8 pages
Proc. SPIE 1442, 7th Mtg in Israel on Optical Engineering, (1 April 1991); doi: 10.1117/12.49055
Show Author Affiliations
Herzl Aharoni, Ben-Gurion Univ. of the Negev (Israel)
Pieter L. Swart, Rand Afrikaans Univ. (South Africa)
Published in SPIE Proceedings Vol. 1442:
7th Mtg in Israel on Optical Engineering
Moshe Oron; Itzhak Shladov, Editor(s)
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