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Proceedings Paper

New approaches for the determination of the parameters in lithography simulation
Author(s): Dietmar Krueger; Christian K. Kalus; Bernd Tollkuehn; Andreas Erdmann
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Paper Details

Date Published:
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Proc. SPIE 4691, Optical Microlithography XV, ; doi: 10.1117/12.490531
Show Author Affiliations
Dietmar Krueger, Sigma-C GmbH (Germany)
Christian K. Kalus, Sigma-C GmbH (Germany)
Bernd Tollkuehn, Fraunhofer-Institut fuer Integrierte Schaltungen (Germany)
Andreas Erdmann, Fraunhofer-Institut fuer Integrierte Schaltungen (Germany)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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