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Proceedings Paper

Model-based corrections for complementary phase-shift mask toward 70-nm technology node
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Paper Details

Date Published: 30 July 2002
PDF: 12 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.490520
Show Author Affiliations
Frank A.J.M. Driessen, IMEC (Germany)
Geert Vandenberghe, IMEC (Belgium)
Monique Ercken, IMEC (Belgium)
Patrick K. Montgomery, Motorola (Belgium)
Kurt G. Ronse, IMEC (Belgium)
Paul van Adrichem, Numerical Technologies, Inc. (United States)
Jason Li, Numerical Technologies, Inc. (United States)
Hua-Yu Liu, Numerical Technologies, Inc. (United States)
Linard Karklin, Numerical Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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