Share Email Print
cover

Proceedings Paper

Imprint lithography: lab curiosity or the real NGL
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The escalating cost for Next Generation Lithography (NGL) tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, a prohibitive number for many companies. As a result, several researchers are looking at low cost alternative methods for printing sub-100 nm features. In the mid-1990s, several resarech groups started investigating different methods for imprinting small features. Many of these methods, although very effective at printing small features across an entire wafer, are limited in their ability to do precise overlay. In 1999, Willson and Sreenivasan discovered that imprinting could be done at low pressures and at room temperatures by using low viscosity UV curable monomers. The technology is typically referred to as Step and Flash Imprint Lithography. The use of a quartz template enabled the photocuring process to occur and also opened up the potential for optical alignment of teh wafer and template. This paper traces the development of nanoimprint lithography and addresses the issues that must be solved if this type of technology is to be applied to high-density silicon integrated circuitry.

Paper Details

Date Published: 16 June 2003
PDF: 12 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.490126
Show Author Affiliations
Douglas J. Resnick, Motorola, Inc. (United States)
William J. Dauksher, Motorola, Inc. (United States)
David P. Mancini, Motorola, Inc. (United States)
Kevin J. Nordquist, Motorola, Inc. (United States)
Todd C. Bailey, Univ. of Texas at Austin (United States)
Stephen C. Johnson, Univ. of Texas at Austin (United States)
Nicholas A. Stacey, Univ. of Texas at Austin (United States)
John G. Ekerdt, Univ. of Texas at Austin (United States)
C. Grant Willson, Univ. of Texas at Austin (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)
Norman E. Schumaker, Molecular Imprints, Inc. (United States)


Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

© SPIE. Terms of Use
Back to Top