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New alternating PSM structure, SCAAM, for ArF lithography at the 100nm node and below
Author(s): Haruo Kokubo; Yasutaka Morikawa; Yousuke Totsu; Morihisa Hoga; Naoya Hayashi
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Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, ; doi: 10.1117/12.489850
Show Author Affiliations
Haruo Kokubo, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Yousuke Totsu, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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