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Proceedings Paper

Integrated data processing system for effective production of reticle
Author(s): Yukio Maruta; I. Takahashi; Yukisada Horie; Youji Shibata; K. Yoshida; Touru Miyauchi; Takeo Moriyama
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Paper Details

Date Published:
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Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, ; doi: 10.1117/12.489845
Show Author Affiliations
Yukio Maruta, Fujitsu VLSI Ltd. (Japan)
I. Takahashi, Fujitsu VLSI Ltd. (Japan)
Yukisada Horie, Fujitsu VLSI Ltd. (Japan)
Youji Shibata, Fujitsu VLSI Ltd. (Japan)
K. Yoshida, Fujitsu VLSI Ltd. (Japan)
Touru Miyauchi, Fujitsu VLSI Ltd. (Japan)
Takeo Moriyama, Fujitsu VLSI Ltd. (Japan)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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