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Proceedings Paper

Compact high-power laser-produced-plasma x-ray and EUV sources for lithography
Author(s): I. C. Edmond Turcu; Celestino J. Gaeta; Harry Rieger; Richard Alan Forber; S. M. Campeau; Kelly L. Cassidy; Michael F. Powers; Juan R. Maldonado; G. French; Joe R. Naunguyan; Charles Kelsy; Peter Hark; James H. Morris; Richard M. Foster
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Paper Details

Date Published:
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Proc. SPIE 4760, High-Power Laser Ablation IV, ; doi: 10.1117/12.489779
Show Author Affiliations
I. C. Edmond Turcu, JMAR Research Inc. (United States)
Celestino J. Gaeta, JMAR Research Inc. (United States)
Harry Rieger, JMAR Research Inc. (United States)
Richard Alan Forber, JMAR Research Inc. (United States)
S. M. Campeau, JMAR Research Inc. (United States)
Kelly L. Cassidy, JMAR Research Inc. (United States)
Michael F. Powers, JMAR Research Inc. (United States)
Juan R. Maldonado, JMAR Research Inc. (United States)
G. French, JMAR Research Inc. (United States)
Joe R. Naunguyan, JMAR Research Inc. (United States)
Charles Kelsy, JMAR Research Inc. (United States)
Peter Hark, JMAR Research Inc. (United States)
James H. Morris, JMAR Research Inc. (United States)
Richard M. Foster, JMAR Research Inc. (United States)


Published in SPIE Proceedings Vol. 4760:
High-Power Laser Ablation IV
Claude R. Phipps, Editor(s)

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