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Proceedings Paper

Selective metal deposition using low-dose focused ion-beam patterning
Author(s): Randall L. Kubena; Fred P. Stratton; Thomas M. Mayer
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Paper Details

Date Published: 1 March 1991
PDF: 3 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48964
Show Author Affiliations
Randall L. Kubena, Hughes Research Labs. (United States)
Fred P. Stratton, Hughes Research Labs. (United States)
Thomas M. Mayer, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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