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Proceedings Paper

Instantaneous etch rate measurement of thin transparent films by interferometry for use in an algorithm to control a plasma etcher
Author(s): Helen L. Mishurda; Noah Hershkowitz
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Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48961
Show Author Affiliations
Helen L. Mishurda, Univ. of Wisconsin/Madison (United States)
Noah Hershkowitz, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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