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Proceedings Paper

Focused ion-beam vacuum lithography of InP with an ultrathin native oxide resist
Author(s): Yuh-Lin Wang; Henryk Temkin; Lloyd R. Harriott; Robert A. Hamm
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Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48952
Show Author Affiliations
Yuh-Lin Wang, AT&T Bell Labs. (United States)
Henryk Temkin, AT&T Bell Labs. (United States)
Lloyd R. Harriott, AT&T Bell Labs. (United States)
Robert A. Hamm, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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