Share Email Print
cover

Proceedings Paper

Multichamber reactive ion etching processing for III-V optoelectronic devices
Author(s): Mark A. Rothman; John A. Thompson; Craig A. Armiento
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48951
Show Author Affiliations
Mark A. Rothman, GTE Labs. Inc. (United States)
John A. Thompson, GTE Labs. Inc. (United States)
Craig A. Armiento, GTE Labs. Inc. (United States)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

© SPIE. Terms of Use
Back to Top