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Proceedings Paper

Multichamber reactive ion etching processing for III-V optoelectronic devices
Author(s): Mark A. Rothman; John A. Thompson; Craig A. Armiento
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Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48951
Show Author Affiliations
Mark A. Rothman, GTE Labs. Inc. (United States)
John A. Thompson, GTE Labs. Inc. (United States)
Craig A. Armiento, GTE Labs. Inc. (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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