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Proceedings Paper

Fast-injection Langmuir probe for process diagnostic and control
Author(s): Roger Patrick; Philippe Schoenborn; Stefan Linder; Henry Baltes
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Paper Abstract

A commercially available fast injection Langmuir probe system (FILP) has been mounted on a plasma etching tool which is widely used in the semiconductor industry. The FILP has been used to obtain information on fundamental plasma parameters such as density and plasma potential as a function of machine parameters such as pressure, gas composition and power. A study has also been made of the correlation of ion density and silicon dioxide etch rate in a CF4 plasma.

Paper Details

Date Published: 1 March 1991
PDF: 8 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48943
Show Author Affiliations
Roger Patrick, LSI Logic Corp. (United States)
Philippe Schoenborn, LSI Logic Corp. (United States)
Stefan Linder, ETH-Hoenggerberg (Switzerland)
Henry Baltes, ETH-Hoenggerberg (Switzerland)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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