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Proceedings Paper

Applications of optical emission spectroscopy in plasma manufacturing systems
Author(s): George G. Gifford
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Paper Abstract

Optical ernissn)n spectroscopy (OES) is an established laboratory diagnostic technique for plasma processes. By detecting light from the electronic transitions of atoms and molecules it is possible to identify and monitor the chemical species in a plasma. This technique has been extended to semiconductor manufacturing to determine the endpoint of plasma processes. The production of semiconductor devices relies heavily on plasma etching and deposition processes. Because OES is a fairly simple technique its use as a continuous tool and process hionitor has been investigated. Ultimately this technique could provide immediate feedback for automatic adjustment of individual process parameters. This embodiment has been referred to as adaptive process control.

Paper Details

Date Published: 1 March 1991
PDF: 12 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48938
Show Author Affiliations
George G. Gifford, IBM/East Fishkill Facility (United States)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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