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Proceedings Paper

Real-time monitoring and control of plasma etching
Author(s): Stephanie Watts Butler; Kevin J. McLaughlin; Thomas F. Edgar; Isaac Trachtenberg
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Paper Details

Date Published: 1 March 1991
PDF: 12 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48930
Show Author Affiliations
Stephanie Watts Butler, Univ. of Texas/Austin (United States)
Kevin J. McLaughlin, Univ. of Texas/Austin (United States)
Thomas F. Edgar, Univ. of Texas/Austin (United States)
Isaac Trachtenberg, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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