Share Email Print

Proceedings Paper

Enhanced etching of InP by cycling with sputter etching and reactive ion etching
Author(s): Alexandros T. Demos; H. S. Fogler; Stella W. Pang; Michael E. Elta
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48924
Show Author Affiliations
Alexandros T. Demos, Univ. of Michigan (United States)
H. S. Fogler, Univ. of Michigan (United States)
Stella W. Pang, Univ. of Michigan (United States)
Michael E. Elta, Univ. of Michigan (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

© SPIE. Terms of Use
Back to Top