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Proceedings Paper

Spin-on-glass/phosphosilicate glass etchback planarization process for 1.0 um CMOS technology
Author(s): Elizabeth Bogle-Rohwer; James E. Nulty; Wileen Chu; Andrew Cohen
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Paper Details

Date Published: 1 March 1991
PDF: 11 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48923
Show Author Affiliations
Elizabeth Bogle-Rohwer, Drytek/General Signal (United States)
James E. Nulty, Drytek/General Signal (United States)
Wileen Chu, National Semiconductor Corp. (United States)
Andrew Cohen, National Semiconductor Corp. (United States)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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