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Proceedings Paper

Chlorine or bromine chemistry in reactive ion etching Si-trench etching
Author(s): Ivo W. Rangelow; Andreas Fichelscher
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Paper Details

Date Published: 1 March 1991
PDF: 6 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48918
Show Author Affiliations
Ivo W. Rangelow, Univ. of Kassel (Germany)
Andreas Fichelscher, Univ. of Kassel (Germany)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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