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Proceedings Paper

Polysilicon etching for nanometer-scale features
Author(s): Jean Lajzerowicz; Serge V. Tedesco; Christophe Pierrat; D. Muyard; M. C. Taccussel; Philippe Laporte
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Paper Details

Date Published: 1 March 1991
PDF: 10 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48916
Show Author Affiliations
Jean Lajzerowicz, LETI/Commissariat a l'Energie Atomique (France)
Serge V. Tedesco, LETI/Commissariat a l'Energie Atomique (France)
Christophe Pierrat, LETI/Commissariat a l'Energie Atomique (France)
D. Muyard, LETI/Commissariat a l'Energie Atomique (France)
M. C. Taccussel, LETI/Commissariat a l'Energie Atomique (France)
Philippe Laporte, LETI/Commissariat a l'Energie Atomique (France)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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