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Proceedings Paper

Plasma diagnostics as inputs to the modeling of the oxygen reactive ion etching of multilevel resist structures
Author(s): D. A. O. Hope; A. J. Hydes; Tim I. Cox; V. G. I. Deshmukh
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Paper Details

Date Published: 1 March 1991
PDF: 11 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48913
Show Author Affiliations
D. A. O. Hope, Royal Signals and Radar Establishment (United Kingdom)
A. J. Hydes, Royal Signals and Radar Establishment (United Kingdom)
Tim I. Cox, Royal Signals and Radar Establishment (United Kingdom)
V. G. I. Deshmukh, Royal Signals and Radar Establishment (United Kingdom)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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