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Proceedings Paper

SPEEDIE: a profile simulator for etching and deposition
Author(s): James P. McVittie; Juan C. Rey; A. J. Bariya; M. M. IslamRaja; L. Y. Cheng; S. Ravi; Krishna C. Saraswat
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Paper Details

Date Published: 1 March 1991
PDF: 13 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48908
Show Author Affiliations
James P. McVittie, Stanford Univ. (United States)
Juan C. Rey, Stanford Univ. (United States)
A. J. Bariya, Stanford Univ. (United States)
M. M. IslamRaja, Stanford Univ. (United States)
L. Y. Cheng, Stanford Univ. (United States)
S. Ravi, Stanford Univ. (United States)
Krishna C. Saraswat, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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