Share Email Print

Proceedings Paper

Progress of an advanced diffusion source plasma reactor
Author(s): Neil M. P. Benjamin; Brian N. Chapman; Rod W. Boswell
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

While the main thrust for downstream reactors has so far focussed on electron cyclotron resonance (ECR) sources operating at 2. 45MHz there are potential price versus performance advantages to be obtained from working in the more conventional 13. 56 MHz frequency regime with novel antenna structures. Desirable features such as high rate uniform etching with low bias capability are retained while others such as reactant use and field efficiency are improved. Progress towards a practical realization of such a reactor will be reported and results obtained in a test stand operation will be presented for a variety of materials and conditions.

Paper Details

Date Published: 1 March 1991
PDF: 11 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48906
Show Author Affiliations
Neil M. P. Benjamin, Lucas/Signatone Corp. (United States)
Brian N. Chapman, Lucas/Signatone Corp. (United States)
Rod W. Boswell, Australian National Univ. (Australia)

Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

© SPIE. Terms of Use
Back to Top