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Proceedings Paper

Progress of an advanced diffusion source plasma reactor
Author(s): Neil M. P. Benjamin; Brian N. Chapman; Rod W. Boswell
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Paper Details

Date Published: 1 March 1991
PDF: 11 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48906
Show Author Affiliations
Neil M. P. Benjamin, Lucas/Signatone Corp. (United States)
Brian N. Chapman, Lucas/Signatone Corp. (United States)
Rod W. Boswell, Australian National Univ. (Australia)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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