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Proceedings Paper

Plasma modeling in microelectronic processing
Author(s): Meyya Meyyappan; T. R. Govindan; John P. Kreskovsky
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Paper Abstract

A continuum model for radiofrequency discharges valid at low pressures is presented. The analysis involves solution of the moments of the Boltzmann transport equations. A case study of 13. 56 MHz argon discharge at 300 mTorr is presented as an example. The analysis indicates that the major source of ionization is the bulk region of the discharge in contrast for discharges above 0. 5 Torr previous continuum models showed that the ionization rate peaks near the sheath/glow interface.

Paper Details

Date Published: 1 March 1991
PDF: 10 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48903
Show Author Affiliations
Meyya Meyyappan, Scientific Research Associates, Inc. (United States)
T. R. Govindan, Scientific Research Associates, Inc. (United States)
John P. Kreskovsky, Scientific Research Associates, Inc. (United States)


Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)

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