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Proceedings Paper

Fabrication of nano-interdigitated electrodes
Author(s): Luca Berdondini; Martin Kalbac; Sebastien Gautsch; Maurizio Gullo; Urs Staufer; Milena Koudelka-Hep; Nico F de Rooij
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Paper Abstract

Thin-film Pt nano interdigitated electrodes realized by combining e-beam lithography and standard photolithography are presented. The resulting nano-IDAs have an active area of 76 μm × 100 μm, an electrode pitch of 785 nm and a gap of 250 nm. The initial results show that this technology is well adapted for the realization of sub-micrometer metallic structures.

Paper Details

Date Published: 24 April 2003
PDF: 4 pages
Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); doi: 10.1117/12.488975
Show Author Affiliations
Luca Berdondini, Univ. de Neuchatel (Switzerland)
Martin Kalbac, Charles Univ. (Czech Republic)
Sebastien Gautsch, Univ. de Neuchatel (Switzerland)
Maurizio Gullo, Univ. de Neuchatel (Switzerland)
Urs Staufer, Univ. de Neuchatel (Switzerland)
Milena Koudelka-Hep, Univ. de Neuchatel (Switzerland)
Nico F de Rooij, Univ. de Neuchatel (Switzerland)


Published in SPIE Proceedings Vol. 5116:
Smart Sensors, Actuators, and MEMS
Jung-Chih Chiao; Vijay K. Varadan; Carles Cané, Editor(s)

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