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Proceedings Paper

Identification and quantitative analysis of contaminants found in photolithography purge gases
Author(s): Allan Tram; Jeff J. Spiegelman; Russell J. Holmes; Daniel Alvarez; Dan Lev
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Paper Abstract

The measurement of organic and inorganic contaminants in photolithography purge gas is validated to below a 1 part-per-trillion lower detection limit using a Cold Trap concentrated method. To investigate the contaminant loading history into a purifier during its lifetime, a Purifier Information Retrieval Service (PIRS) is developed with measurement sensitivity below 0.01 microgram. This method is validated by accurately loading and unloading known challenges of contaminants into a GateKeeper purifier. The result indicates that if a purifier is operating at 100% duty cycle and 1 slm for 1 year, an annual quantitative measurement average of the impurites in the process gas of less than 5 part-per-quadrillion can be achieved.

Paper Details

Date Published: 2 June 2003
PDF: 11 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.488483
Show Author Affiliations
Allan Tram, Aeronex, Inc. (United States)
Jeff J. Spiegelman, Aeronex, Inc. (United States)
Russell J. Holmes, Aeronex, Inc. (United States)
Daniel Alvarez, Aeronex, Inc. (United States)
Dan Lev, Aeronex, Inc. (United States)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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