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Proceedings Paper

New method to enhance overlay tool performance
Author(s): Ravikiran Attota; Richard M. Silver; Michael T. Stocker; Egon Marx; Jau-Shi Jay Jun; Mark P. Davidson; Robert D. Larrabee
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Paper Abstract

New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We have identified error sources that arise from (i) the optical cross talk between neighboring lines on an overlay target (ii) the selection of the window size used in the auto-correlation and (iii) the portion of the intensity profile that is used in the overlay calculation (defined as a truncated profile). Further, we suggest methods to optimally minimize these error sources. We also present a relationship between tool-induced shift (TIS) and the asymmetry in the intensity profile.

Paper Details

Date Published: 2 June 2003
PDF: 9 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.488481
Show Author Affiliations
Ravikiran Attota, National Institute of Standards and Technology (United States)
Richard M. Silver, National Institute of Standards and Technology (United States)
Michael T. Stocker, National Institute of Standards and Technology (United States)
Egon Marx, National Institute of Standards and Technology (United States)
Jau-Shi Jay Jun, National Institute of Standards and Technology (United States)
Mark P. Davidson, Spectel Research Corp. (United States)
Robert D. Larrabee, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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