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Proceedings Paper

Method for rapid screening of photoresist strippers for acceptance in DUV lithographic areas
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Paper Abstract

Airborne contaminants have been shown to cause image degradation to acid-catalyzed chemcially amplified resists at low concentrations. In addition to mitigation measures, choices can be made to remove resist strippers from the DUV fab and eliminate those known to poison the resist. Such choices can be made based on the evaporative alkalinity of the stripper. A method has been developed as a rapid technique for testing the ariborne alkalinity strength of various resist strippers. This screening technique provides rapid information at minimal cost to qualify safe chemical strippers for the DUV fab. Experimental results on resist strippers to include commoditites such as isopropanol, a cyclic ketone, amide, and specialty blends that contain amines as well as a high performance product, GenSolve.

Paper Details

Date Published: 2 June 2003
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.488118
Show Author Affiliations
John C. Moore, General Chemical Corp. (United States)
Shankar C. Acharya, General Chemical Corp. (United States)


Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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