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Proceedings Paper

Reflective optical designs for soft x-ray projection lithography
Author(s): Tanya E. Jewell; Kevin P. Thompson; J. Michael Rodgers
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Paper Abstract

All-reflective, unobscured optical designs were developed to help identify a candidate first- generation system to be used in soft x-ray projection lithography. The resolution goal for all designs was 0.1 micrometers , or better, at a design wavelength of 13 nm. Different design aspects including usable field size, image distortion, number of mirrors, telecentricity, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studied between systems requiring scanning and full-format nonscanning systems were made. The tolerance sensitivity analysis for a representative design demonstrated that as-built performance will be driven by the mirror surface irregularity tolerance; the required tolerance levels are briefly discussed.

Paper Details

Date Published: 1 December 1991
PDF: 11 pages
Proc. SPIE 1527, Current Developments in Optical Design and Optical Engineering, (1 December 1991); doi: 10.1117/12.48683
Show Author Affiliations
Tanya E. Jewell, AT&T Bell Labs. (United States)
Kevin P. Thompson, Optical Research Associates (United States)
J. Michael Rodgers, Optical Research Associates (United States)


Published in SPIE Proceedings Vol. 1527:
Current Developments in Optical Design and Optical Engineering
Robert E. Fischer; Warren J. Smith, Editor(s)

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