Share Email Print
cover

Proceedings Paper

Selective thermo/photochemical treatment of materials: a new trend in laser microtechnology
Author(s): Simeon Metev; Andreas Stephen; Jorg Schwarz; Carsten Wochnowski
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Laser-induced technological chemical processes can significantly contribute to the development of new methods for micro treatment of materials and hence to the broadening of the application spectrum of laser microtechnology. In this paper three typical laser-activated chemical technological methods in liquids, gases and solids and their possible applications are presented and discussed: 1) Laser-induced liquid-phase jet-chemical etching of metals. In this method, laser radiation which is guided from a co-axially expanding liquid jet-stream initiates locally on a metal surface a thermochemical etching reaction, which leads to a selective material removal at high resolution (<1μm) and quality of the treated surface; 2) Local photon-plasma induced synthesis of thin film coatings. This technological method is based on thermochemical CVD processes taking place in a photon-initiated stationary plasma maintained in the electromagnetic optical field of a high-power cw-CO2 laser radiation. This method allows synthesis of thin-film coatings in the open-air atmosphere without using vacuum or reaction chamber; 3) Laser-induced photochemical modification of the optical properties of polymers. This method is based on the local controllable change of the polymer structure leading to modification of the refractive index in the treated area. By numerous independently adjustable laser radiation parameters, for instance wavelength and irradiation dose, the modification process can be controllably driven in order to generate desired functional properties.

Paper Details

Date Published: 19 February 2003
PDF: 6 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486583
Show Author Affiliations
Simeon Metev, Bremen Institute of Applied Beam Technology (Germany)
Andreas Stephen, Bremen Institute of Applied Beam Technology (Germany)
Jorg Schwarz, Bremen Institute of Applied Beam Technology (Germany)
Carsten Wochnowski, Bremen Institute of Applied Beam Technology (Germany)


Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

© SPIE. Terms of Use
Back to Top