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Proceedings Paper

How to sensitively measure the rate of neutral free-radical production by photodeionization of negative ion beams
Author(s): Keiji Hayashi; Hiroshi Konno; Hideki Kojima; Makoto Minato; Takashi Oseki; Yasunori Kawamura; Kenji Kameko; Takuo Kanayama
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Paper Abstract

Two measurement methods to determine the rate of neutral free radical production by the photo-deionization of negative ion beams ( PDINIB ) are introduced. These methods, namely, photoelectron-current measurement by low-frequency electro-modulation probe ( PMMP ) and measurement of decrease in the negative-ion beam current ( DNIC ) were employed to evaluate the production rate in a trail surface-processing apparatus developed in the author’s laboratory utilizing a steady-flux refined beam of neutral free radicals produced by the PDINIB procedure. A 63Cu- negative ion beam of kinetic energy Ei varied up to 15 keV was irradiated with a 514.5 nm visible light beam from a 25 W CW Ar+ ion laser. The detection limit of the production rate by the PMMP setup was as high as 6×109/s under the condition that Ei = 15keV, the negative ion beam current Ii = 4 μA, and the laser power P = 6W. The DNIC method is simpler but less reliable than the PMMP method owing to larger uncertainty resulting from the fluctuation of the negative-ion beam current.

Paper Details

Date Published: 19 February 2003
PDF: 5 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486564
Show Author Affiliations
Keiji Hayashi, Kanazawa Institute of Technology (Japan)
Hiroshi Konno, Kanazawa Institute of Technology (Japan)
Hideki Kojima, Kanazawa Institute of Technology (Japan)
Makoto Minato, Kanazawa Institute of Technology (Japan)
Takashi Oseki, Kanazawa Institute of Technology (Japan)
Yasunori Kawamura, Kanazawa Institute of Technology (Japan)
Kenji Kameko, Kanazawa Institute of Technology (Japan)
Takuo Kanayama, Kanazawa Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

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