Share Email Print
cover

Proceedings Paper

Athermal optical waveguide filter fabricated by short pulse laser irradiation
Author(s): Junji Nishii; Kenji Kintaka; Yasushi Kawamoto; Masahide Takahashi
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Ge-SiO2 thin films with extremely high photosensitivity against excimer laser light were fabricated by plasma enhanced chemical vapor deposition method. Direct formation of channel waveguide was successfully confirmed only by irradiation with excimer laser through a Cr mask pattern, which was previously coated on the slab-waveguide by sputtering method. Bragg gratings with high diffraction efficiency were also printed in the waveguide by another laser irradiation through the phase mask. Channel waveguides with Bragg gratings, on the other hand, were fabricated on the glass ceramic substrates with negative thermal expansion coefficient. Doping of B2O3 to Ge-SiO2 glass film was effectively suppressed the temperature drift of the stop band (dλ/dT)of the grating. The dλ/dT attained in this study was 5pm/°C, which was less than ½ of those for commercially available waveguide gratings. The waveguides with gratings using the photosensitive oxide thin films should be a promising candidate for future low cost and reliable optical access network.

Paper Details

Date Published: 19 February 2003
PDF: 6 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486530
Show Author Affiliations
Junji Nishii, National Institute of Advanced Industrial Science and Technology (Japan)
Kenji Kintaka, National Institute of Advanced Industrial Science and Technology (Japan)
Yasushi Kawamoto, Moritex Co. (Japan)
Masahide Takahashi, Kyoto Univ. (Japan)


Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

© SPIE. Terms of Use
Back to Top