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Proceedings Paper

Beamsplitting ZnSe diffractive optical element
Author(s): Kenichi Kurisu; Takayuki Hirai; Toshihiko Ushiro; Keiji Fuse; Takeshi Okada; Keiji Ebata
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Paper Abstract

ZnSe Diffractive Optical Element (DOE) is one of the advanced optics which utilizes the optical diffraction phenomena by fabricating a micron order pattern on polished mirror-like surface of ZnSe polycrystal substrate. Various applications for a carbon dioxide (CO2) laser material processing such as beam-splitting, beam-shaping and beam-homogenizing are available. The micro pattern of ZnSe DOE is fabricated by the photolithography and reactive ion etching (RIE) technique. Its optical property is highly dependent on the depth precision of microfabricated pattern. In RIE by using BCl3 as the etchant gas we have achieved an etching technique to maintain the smooth surface of the ZnSe polycrystal with minimal etching rate dependency on the crystal orientation of each crystal grain. The surface roughness is 2nm Ra before etching and 5 nm Ra after about 4 microns depth etching. This good roughness brings better depth precision. With these etching technique beam-splitting ZnSe DOE with less than 10% intensity uniformity of splitted beams is successfully obtained and it can be put to use for practical CO2 laser hole drilling.

Paper Details

Date Published: 19 February 2003
PDF: 6 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486527
Show Author Affiliations
Kenichi Kurisu, Sumitomo Electric Industries, Ltd. (Japan)
Takayuki Hirai, Sumitomo Electric Industries, Ltd. (Japan)
Toshihiko Ushiro, Sumitomo Electric Industries, Ltd. (Japan)
Keiji Fuse, Sumitomo Electric Industries, Ltd. (Japan)
Takeshi Okada, Sumitomo Electric Industries, Ltd. (Japan)
Keiji Ebata, Sumitomo Electric Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

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