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Proceedings Paper

Influence of multilayers on the optical performance of extreme-ultraviolet projection systems
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Paper Abstract

Extreme UltraViolet (EUV) projection systems consist of reflective optics, as the 13.4 nm illuminating radiation is highly absorbed in all materials. The reflectors are multilayers, which typically consist of alternating layers of molybdenum and silicon. The multilayers entail important consequences for the imaging properties, such as resolution, depth of focus and tolerances. To incorporate the influence of multilayers in optical design software an approach using the effective reflective depth is proposed. A new method to calculate the spatially varying optimum thickness of multilayers ('grading') is presented.

Paper Details

Date Published: 23 December 2002
PDF: 9 pages
Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); doi: 10.1117/12.486478
Show Author Affiliations
Matthieu Bal, Delft Univ. of Technology (Netherlands)
Florian Bociort, Delft Univ. of Technology (Netherlands)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 4832:
International Optical Design Conference 2002
Paul K. Manhart; Jose M. Sasian, Editor(s)

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