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Proceedings Paper

High-NA projection lens design for exposure tools
Author(s): Toshiro Ishiyama; Kotaro Yamaguchi
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Paper Abstract

In the history of the semiconductor industry, exposure tools have been improved in resolution. This paper describes how to increase NA of projection lens up to more than 0.7 without increasing lens diameter or deteriorating the aberrations.

Paper Details

Date Published: 23 December 2002
PDF: 6 pages
Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); doi: 10.1117/12.486475
Show Author Affiliations
Toshiro Ishiyama, Nikon Corp. (Japan)
Kotaro Yamaguchi, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4832:
International Optical Design Conference 2002
Paul K. Manhart; Jose M. Sasian, Editor(s)

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