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Proceedings Paper

Study of the influence of substrate topography on the focusing performance of advanced lithography scanners
Author(s): Bruno M. La Fontaine; Jan Hauschild; Mircea V. Dusa; Alden Acheta; Eric M. Apelgren; Marc Boonman; Jouke Krist; Ashok Khathuria; Harry J. Levinson; Anita Fumar-Pici; Marco Pieters
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Paper Abstract

A Phase-Grating Focus Monitor (PGFM) is used to assess the focus control of a state-of-the-art lithography scanner (TWINSCAN AT:1100) over substrate topography. The starting wafer flatness quality is found to be critical in minimizing the overall defocus distribution. In fact, on nearly all wafers, the most significant contributor to defocus across the wafer was the small-scale topography. Results obtained over programmed topography, created by etching various patterns into silicon, are found to agree well with the simulated defocus behavior based on the measurement of the wafer surface obtained on the scanner metrology stage. Finally, we report on preliminary focus control results over realistic device-type substrate topography, involving thin-film and polish effects.

Paper Details

Date Published: 26 June 2003
PDF: 12 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485535
Show Author Affiliations
Bruno M. La Fontaine, Advanced Micro Devices, Inc. (United States)
Jan Hauschild, ASML (Netherlands)
Mircea V. Dusa, ASML (Netherlands)
Alden Acheta, Advanced Micro Devices, Inc. (United States)
Eric M. Apelgren, Advanced Micro Devices, Inc. (United States)
Marc Boonman, ASML (Netherlands)
Jouke Krist, ASML (Netherlands)
Ashok Khathuria, Advanced Micro Devices, Inc. (United States)
Harry J. Levinson, Advanced Micro Devices, Inc. (United States)
Anita Fumar-Pici, ASML (United States)
Marco Pieters, ASML (Netherlands)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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