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Proceedings Paper

Compaction and rarefaction of fused silica with 193-nm excimer laser exposure
Author(s): J. Martin Algots; Richard Sandstrom; William N. Partlo; Petar Maroevic; Eric Eva; Michael Gerhard; Ralf Linder; Frank Stietz
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Paper Abstract

Extensive testing of the laser damage behavior of fused silica has been performed over the past few years by several researchers. The results have shown that compaction and rarefaction / expansion of the material can occur. The actually observed process depends on the used energy density and laser pulse number at constant pulse length. In order to check the influence of the different laser parameters in more detail, an experimental set up has been constructed that allows us to investigate not only the influence of the energy density and laser pulse number but also the effect of the integrated square pulse width on the laser damage behavior. An optical delay line is used to create a longer integrated pulse width than the natural laser pulse width. To make these tests relevant to the microlithography community, the integrated energy densities chosen for these tests span the range typically found in the projection optics of a 193-nm excimer laser-based microlithography tool. The samples are exposed to several billions of pulses with wavefront measurements made periodically.

Paper Details

Date Published: 26 June 2003
PDF: 12 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485530
Show Author Affiliations
J. Martin Algots, Cymer, Inc. (United States)
Richard Sandstrom, Cymer, Inc (United States)
William N. Partlo, Cymer, Inc. (United States)
Petar Maroevic, Cymer, Inc. (United States)
Eric Eva, Carl Zeiss SMT AG (Germany)
Michael Gerhard, Carl Zeiss SMT AG (Germany)
Ralf Linder, Carl Zeiss SMT AG (Germany)
Frank Stietz, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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