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Proceedings Paper

Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection lens aberrations: an initial study
Author(s): Peter De Bisschop
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Paper Abstract

We have set up a series of experiments to evaluate the Litel In-Situ Interferometer (ISI) for measuring projection-lens aberrations of lithographic exposure tools. The current paper describes the results we obtained so far. We believe the ISI is an excellent tool.

Paper Details

Date Published: 26 June 2003
PDF: 13 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485525
Show Author Affiliations
Peter De Bisschop, IMEC (Belgium)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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