Share Email Print
cover

Proceedings Paper

Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Recently, it has shown that Rayleigh diffraction limit (a size λ/2) is overcome using entangled-photon pairs, where λ is the optical wavelength. However, the intensity of the entangled-photon pairs generated from optical parametric down-conversion are so weak that it is not enough to attain the practical throughput. We propose a new method which enables to enhance the resolution over the Rayleigh limit with coherent laser light by using polarization-dependent two-photon absorption resist.

Paper Details

Date Published: 26 June 2003
PDF: 6 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485500
Show Author Affiliations
Hiromi Ezaki, Tokyo Institute of Polytechnics (Japan)
Masato Shibuya, Tokyo Institute of Polytechnics (Japan)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top