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Proceedings Paper

Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist
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Paper Abstract

Recently, it has shown that Rayleigh diffraction limit (a size λ/2) is overcome using entangled-photon pairs, where λ is the optical wavelength. However, the intensity of the entangled-photon pairs generated from optical parametric down-conversion are so weak that it is not enough to attain the practical throughput. We propose a new method which enables to enhance the resolution over the Rayleigh limit with coherent laser light by using polarization-dependent two-photon absorption resist.

Paper Details

Date Published: 26 June 2003
PDF: 6 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485500
Show Author Affiliations
Hiromi Ezaki, Tokyo Institute of Polytechnics (Japan)
Masato Shibuya, Tokyo Institute of Polytechnics (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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