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Domain decomposition methods for simulation of printing and inspection of phase defects
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Paper Abstract

A detailed study of the domain decomposition method by edges (edge-DDM) is used to show the smallest feature sizes that can be accurately simulated using the decomposition, and thereby understand the domain of applicability for this simulation method during printing. For features in arbitrary layouts, edge-DDM is accurate to better than 1% for any mask lateral feature dimension of 2l or longer. The smallest feature dimension could be even smaller, depending on the types of edges present in the layout. Design graphs are produced to show the smallest feature dimension for any specific layout. In general, the TE polarization limits the edge-DDM applicability, and extensions to model the boundary interactions at small CDs may be able to reduce the smallest feature dimension to equal that of the TM polarization, resulting in a 1 - 1.5 λ minimum dimension. A 'defect projector' method for rapidly and accurately simulating defect printability is introduced and combined with edge-DDM. Calculations of the CD change from the defect projector method agree with calculations of CD change from rigorous simulations with embedded defects to within 30%, despite low NILS values from the test structure used in this study. Finally, the impacts on edge-DDM accuracy for both off-axis illumination and the larger numerical apertures utilized during inspection are investigated. Results show that high spatial frequency errors resulting from edge-DDM synthesis of the near fields are problematic for inspection. Asymptotic anticipation is suggested for modeling the high frequency components.

Paper Details

Date Published: 26 June 2003
PDF: 10 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485485
Show Author Affiliations
Michael Lam, Univ. of California/Berkeley (United States)
Konstantinos Adam, Mentor Graphics Corp. (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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