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Proceedings Paper

Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm
Author(s): Theodore M. Bloomstein; Dennis E. Hardy; L. Gomez; Mordechai Rothschild
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Paper Abstract

An angle-resolved scattering detection system has been designed and implemented for use at 157 nm. This tool will enable the optimization of polishing and thin-film deposition, whith an eye towards minimizing small-angle scatter in projection lithography tools. In this test-bed, scattered rays can be collected to 4° from the directional ray of the specularly transmitted beam (corresponding to spatial wavelengths of surface roughness below 2 μm) over a dynamic range of 7 orders of magnitude, and to 0.5° with a dynamic range of 5 orders of magnitude. The angular scattering distributions in CaF2 samples and antireflective coatings are compared. From these results, the impact of scattering on image performance in exposure tools at 157 nm is estimated.

Paper Details

Date Published: 26 June 2003
PDF: 11 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485469
Show Author Affiliations
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Dennis E. Hardy, MIT Lincoln Lab. (United States)
L. Gomez, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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