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Proceedings Paper

Improving lens performance through the most recent lens manufacturing process
Author(s): Tomoyuki Matsuyama; Issei Tanaka; Toshihiko Ozawa; Kazushi Nomura; Takashi Koyama
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Paper Abstract

A continuous demand for finer and finer exposed patterns is pushing the k1 factor down to 0.4 or below, which is very close to its theoretical limit. The low-k1 lithography requires high NA and small residual aberration of a deep ultra-violet (DUV) projection lens system. The amount of aberration of current projection lens is less than design residual value of the lens in a decade ago. A lot of designers’ efforts are put into optical design and opt-mechanical design of the projection lens to meet lithography requirements. However, technological innovations in manufacturing process are also needed for the realization of a state of the art projection lens. In some cases, manufacturing process is rather essential for the final lens performance improvement. This paper shows the most recent lens manufacturing process in Nikon. In addition to the manufacturing process itself, some supporting technologies in the manufacturing process are also reviewed.

Paper Details

Date Published: 26 June 2003
PDF: 10 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485461
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Issei Tanaka, Nikon Corp. (Japan)
Toshihiko Ozawa, Nikon Corp. (Japan)
Kazushi Nomura, Nikon Corp. (Japan)
Takashi Koyama, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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