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Proceedings Paper

Evaluation of Zernike sensitivity method for CD distribution
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Paper Abstract

Wavefront aberrations of the projection lens are measured in many situations. The results are expressed by coefficients of Zernike polynomials that can be used as a basis for critical dimensions (CD) performance evaluation. Here we investigated several methods to obtain the CD distribution from the Zernike coefficients. We present three unique methods, called “Transformation of CD-Focus", "Conversion of Defocus into Aberrations" and “Response Surface of Aerial Image". These methods calculate CD distribution faster than direct simulations. Five tests with different cases were conducted to compare the three methods. Their accuracies are reported.

Paper Details

Date Published: 26 June 2003
PDF: 11 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485454
Show Author Affiliations
Toshiharu Nakashima, Nikon Corp. (Japan)
Steve D. Slonaker, Nikon Precision Inc. (United States)
Takehito Kudo, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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