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Proceedings Paper

Nikon F2 exposure tool development
Author(s): Soichi Owa; Yukako Matsumoto; Yasuhiro Ohmura; Shigeru Sakuma; Takashi Aoki; Jin Nishikawa; Hiroyuki Nagasaka; Takeyuki Mizutani; Naomasa Shiraishi; Kazuhiro Kido; Issei Tanaka; Jun Nagatsuka
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Paper Abstract

Present status of development of F2 (157nm) exposure tool in Nikon is described. Key points of F2 exposure tool are reported; low aberration projection optics, CaF2 quality, coating durability and gas purging of the pellicle space. We also report the measurement of refractive index inhomogeneity inside CaF2 crystals, which is suspected as the cause of local flare. Characteristics of high NA optics over 0.9 are investigated by imaging simulations for both 193nm and 157nm wavelengths, which are compared NA=0.85 imaging.

Paper Details

Date Published: 26 June 2003
PDF: 9 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485451
Show Author Affiliations
Soichi Owa, Nikon Corp. (Japan)
Yukako Matsumoto, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)
Shigeru Sakuma, Nikon Corp. (Japan)
Takashi Aoki, Nikon Corp. (Japan)
Jin Nishikawa, Nikon Corp. (Japan)
Hiroyuki Nagasaka, Nikon Corp. (Japan)
Takeyuki Mizutani, Nikon Corp. (Japan)
Naomasa Shiraishi, Nikon Corp. (Japan)
Kazuhiro Kido, Nikon Corp. (Japan)
Issei Tanaka, Nikon Corp. (Japan)
Jun Nagatsuka, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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