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Proceedings Paper

Web tool for worst-case assessment of aberration effects in printing a layout
Author(s): Frank E. Gennari; Sachan Madahar; Andrew R. Neureuther
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Paper Abstract

A web-based tool is presented that analyzes the worst-case effect of lens aberrations on projection printed layouts. These effects are important to the designer since they can be half as large as those of OPC. They can easily be detected by scanning through the layout and matching the inverse Fourier transform of the aberration function to the local layout geometry at each location of interest. The software system for detecting and quantifying these effects is based on a client/server model, where the user interface runs on the client side as a Java applet and the server has access to the binaries and performs all of the heavy numerical processing. The online system provides direct access to this lithography tool, allowing the user to create custom aberration patterns with Zernike polynomials and input custom mask layouts in either CIF or GDS II formats. As a result of the simulation run, the user is provided with a JPEG image of the match results as well as a text file listing match statistics including coordinate locations of the best matches and the match factors.

Paper Details

Date Published: 26 June 2003
PDF: 9 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485448
Show Author Affiliations
Frank E. Gennari, Univ. of California/Berkeley (United States)
Sachan Madahar, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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