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Proceedings Paper

157-nm Micrascan VII initial lithography results
Author(s): Harry Sewell; Bruce A. Tirri; Timothy O'Neil; Thomas J. Fahey; Diane C. McCafferty; Paul B. Reid; James A. McClay
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Paper Abstract

This paper describes the system performance for Micrascan VII and reports on some of the photo-resist testing results. The challenges of tool design range from the optical form to new resists. The Micrascan VII architecture has the traditional look of the prior Micrascan family of tools. The evolution of design for operation at 157 nm wavelength has been implemented and is presented. The use of calcium fluoride exclusively in the projection optics design presented many challenges. Performance of the projection optics is shown as well as lithographic results. Initial lithographic results indicate that pattern features well below 100 nm can be printed even with first generation 157 nm resists. 60 nm resist lines with 0.3 μm depth of focus are reported.

Paper Details

Date Published: 26 June 2003
PDF: 11 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485423
Show Author Affiliations
Harry Sewell, ASML (United States)
Bruce A. Tirri, ASML (United States)
Timothy O'Neil, ASML (United States)
Thomas J. Fahey, ASML (United States)
Diane C. McCafferty, ASML (United States)
Paul B. Reid, ASML (United States)
James A. McClay, ASML (United States)


Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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